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Volumn 615 617, Issue , 2009, Pages 373-376

Defects in 4H-SiC layers grown by chloride-based epitaxy

Author keywords

Chloride based epitaxy; DLTS; Intrinsic defects; MCTS

Indexed keywords

CHLORINE COMPOUNDS; DEEP LEVEL TRANSIENT SPECTROSCOPY; DEFECTS; ENERGY GAP; EXCITONS;

EID: 79251588054     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.615-617.373     Document Type: Conference Paper
Times cited : (6)

References (10)
  • 2
    • 33947320770 scopus 로고    scopus 로고
    • Impacts of growth parameters on deep levels in n -type 4H-SiC
    • DOI 10.1063/1.2437666
    • K. Danno, T. Hori, T. Kimoto: J. Appl. Phys. Vol. 101 (2007), p. 53709 doi:10.1063/1.2437666. (Pubitemid 46439969)
    • (2007) Journal of Applied Physics , vol.101 , Issue.5 , pp. 053709
    • Danno, K.1    Hori, T.2    Kimoto, T.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.