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Volumn 310, Issue 20, 2008, Pages 4424-4429

On-axis homoepitaxial growth on Si-face 4H-SiC substrates

Author keywords

A1. Atomic force microscopy; A1. Etching; A3. Hot wall epitaxy; B2. Semiconducting materials; B3. Bipolar transistors

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ECOLOGY; EPILAYERS; EPITAXIAL GROWTH; EPITAXIAL LAYERS; METALLORGANIC VAPOR PHASE EPITAXY; MOLECULAR BEAM EPITAXY; OPTICAL ENGINEERING; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON CARBIDE; SURFACE DEFECTS; SURFACE ROUGHNESS; SURFACES;

EID: 52149108918     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.06.081     Document Type: Article
Times cited : (62)

References (31)
  • 25
    • 52149105026 scopus 로고    scopus 로고
    • J. Hassan, J.P. Bergman, A. Henry, E. Janzén, J. Crystal Growth, in press, doi:10.1016/j.crysgro.2008.06.083.
    • J. Hassan, J.P. Bergman, A. Henry, E. Janzén, J. Crystal Growth, in press, doi:10.1016/j.crysgro.2008.06.083.
  • 28
    • 52149093932 scopus 로고    scopus 로고
    • S. Yu. Karpov, Yu. N. Makarov, M.S. Ramm, Silicon carbide and related materials 1995, in: Proceedings of the Sixth International Conference, 1996, pp. 177-80.
    • S. Yu. Karpov, Yu. N. Makarov, M.S. Ramm, Silicon carbide and related materials 1995, in: Proceedings of the Sixth International Conference, 1996, pp. 177-80.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.