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Volumn 202, Issue 1, 1997, Pages 263-279

Homoepitaxial VPE growth of SiC active layers

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0039918352     PISSN: 03701972     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3951(199707)202:1<263::aid-pssb263>3.0.co;2-y     Document Type: Article
Times cited : (48)

References (48)
  • 26
    • 0040194011 scopus 로고    scopus 로고
    • U.S. Patent No. 501 1549 (April 30, 1991)
    • H. S. KONG, J. T. GLASS, and R. F. DAVIS, U.S. Patent No. 501 1549 (April 30, 1991).
    • Kong, H.S.1    Glass, J.T.2    Davis, R.F.3
  • 36
    • 0040788417 scopus 로고    scopus 로고
    • PhD Thesis, Linköping University, Sweden
    • C. HALLIN, PhD Thesis, Linköping University, Sweden, 1996.
    • (1996)
    • Hallin, C.1
  • 44
    • 0040788409 scopus 로고    scopus 로고
    • Aixtron Inc., Kackerstr. 15-17, D-52072 Aachen, Germany
    • Aixtron Inc., Kackerstr. 15-17, D-52072 Aachen, Germany.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.