SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Crystal Growth

Volumn 243, Issue 1, 2002, Pages 170-184

Growth rate predictions of chemical vapor deposited silicon carbide epitaxial layers

(3) Danielsson, O a Henry, A a Janzen E a

a LINKÖPING UNIVERSITY (Sweden)

Author keywords

A1. Computer simulation; A1. Growth models; A3. Chemical vapor deposition; A3. Hot wall epitaxy; B2. Semiconducting silicon carbide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ETCHING; FLUID DYNAMICS; SILICON CARBIDE;

EPITAXIAL LAYERS;

CRYSTAL GROWTH;

EID: 0036070329 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(02)01486-0 Document Type: Article

Times cited : (99)

References (60)

1
- 21544461610
- (1994) J. Appl. Phys. , vol.76 , pp. 1363
- Morkoc, H.¹ Strite, S.² Gao, G.B.³ Lin, M.E.⁴ Sverdlov, B.⁵ Burns, M.⁶

2
- 0031536335
- (1997) Phys. Stat. Sol. (b) , vol.202 , pp. 321
- Kordina, O.¹ Hallin, C.² Henry, A.³ Bergman, J.P.⁴ Ivanov, I.G.⁵ Ellison, A.⁶ Son, N.T.⁷ Janzén, E.⁸

3
- 0031514277
- (1997) Phys. Stat. Sol. (b) , vol.202 , pp. 247
- Kimoto, T.¹ Itoh, A.² Matsunami, H.³

4
- 0023978923
- (1988) J. Crystal Growth , vol.87 , pp. 481
- Stinespring, C.D.¹ Wormhoudt, J.C.²

5
- 0026116911
- (1991) J. Electrochem. Soc. , vol.138 , pp. 841
- Allendorf, M.D.¹ Kee, R.J.²

6
- 0033875289
- (2000) J. Electrochem. Soc. , vol.147 , pp. 164
- Löfgren, P.M.¹ Ji, W.² Hallin, C.³ Gu, C.-Y.⁴

7
- 0036467197
- (2002) J. Crystal Growth , vol.235 , pp. 352
- Danielsson, Ö.¹ Forsberg, U.² Henry, A.³ Janzén, E.⁴

8
- 0033737970
- (2000) Diamond Rel. Mater. , vol.9 , pp. 472
- Vorob'ev, A.N.¹ Karpov, S.Yu.² Bord, O.V.³ Zhmakin, A.I.⁴ Lovtsus, A.A.⁵ Makarov, Yu.N.⁶

9
- 0031698054
- (1998) J. Crystal Growth , vol.183 , pp. 163
- Hallin, C.¹ Ivanov, I.G.² Egilsson, T.³ Henry, A.⁴ Kordina, O.⁵ Janzen, E.⁶

10
- 0000375655
- (1995) The Phoenics J. Computat. Fluid Dyn. , vol.8 , pp. 404
- Kleijn, C.R.¹ Kuijlaars, K.J.²

11
- 0000888799
- (1995) The Phoenics J. Computat. Fluid Dyn. , vol.8 , pp. 439
- Kuijlaars, K.J.¹ Kleijn, C.R.² Van der Akker, H.E.A.³

12
- 0022739459
- (1986) J. Electrochem. Soc. , vol.133 , pp. 1206
- Coltrin, M.E.¹ Kee, R.J.² Miller, A.³

13
- 0003987835
- Oxford University Press, Oxford, ISBN: 0-19-854493-6
- (1988) Physical Fluid Dynamics, 2nd Edition
- Tritton, D.J.¹

14
- 0005714098
- (2002) Mater. Sci. Forum , vol.389-393 , pp. 219
- Danielsson, Ö.¹ Jönsson, S.² Henry, A.³ Janzén, E.⁴

15
- 0035307399
- (2001) J. Crystal Growth , vol.224 , pp. 165
- Mazumder, S.¹ Lowry, S.A.²

16
- 29744448914
- (1986) J. Phys. Chem. Ref. Data , vol.15 , pp. 1087
- Tsang, W.¹ Hampson, R.F.²

17
- 0001622837
- (1994) J. Phys. Chem. , vol.98 , pp. 10138
- Ho, P.¹ Coltrin, M.E.² Breiland, W.G.³

18
- 0001883643
- (1996) Contrib. Plasma Phys. , vol.36 , pp. 3
- Perrin, J.¹ Leroy, O.² Bordage, M.C.³

19
- 84975402284
- (1993) J. Electrochem. Soc. , vol.140 , pp. 747
- Allendorf, M.D.¹

20
- 0001629206
- (1999) J. de Phys. IV , vol.9 , pp. 205
- Raffy, C.¹ Blanquet, E.² Pons, M.³ Bernard, C.⁴ Melius, C.F.⁵ Allendorf, M.D.⁶

21
- 0005774590
- (2000) Electrochem. Soc. Proc. , vol.13 , pp. 41
- Raffy, C.¹ Allendorf, M.D.² Blanquet, E.³ Melius, C.F.⁴

22
- 0034878660
- Mater. Res. Soc.
- (2001) Mat. Res. Soc. Symp. Proc. , vol.640
- Pons, M.¹ Mezière, J.² Dedulle, J.M.³ Wan Tang Kuan, S.⁴ Blanquet, E.⁵ Bernard, C.⁶ Ferret, P.⁷ Di Cioccio, L.⁸ Billon, T.⁹ Madar, R.¹⁰

23
- 0035878660
- (2001) J. Appl. Phys. , vol.90 , pp. 619
- Petrov, G.M.¹ Giuliani, J.L.²

24
- 0021374024
- (1984) J. Electrochem. Soc. , vol.131 , pp. 425
- Coltrin, M.E.¹ Kee, R.J.² Miller, J.A.³

25
- 0024620141
- (1989) J. Electrochem. Soc. , vol.136 , pp. 819
- Coltrin, M.E.¹ Kee, R.J.² Evans, G.H.³

26
- 0032398538
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 544
- Meeks, E.¹ Larson, R.S.² Ho, P.³ Apblett, C.⁴ Han, S.M.⁵ Edelberg, E.⁶ Aydil, E.S.⁷

27
- 0000117452
- (1985) Chem. Phys. Lett. , vol.122 , pp. 361
- Inoue, G.¹ Suzuki, M.²

28
- 0001717767
- (1993) J. Phys. Chem. , vol.97 , pp. 9392
- Niiranen, J.T.¹ Gutman, D.²

29
- 0033722863
- (2000) Thin Solid Films , vol.368 , pp. 176
- Arthur, N.L.¹ Cooper, I.A.² Czerwinski, A.³ Miles, L.A.⁴

30
- 0001188736
- (1987) J. Phys. Chem. , vol.91 , pp. 5340
- Chu, J.O.¹ Beach, D.B.² Jasinski, J.M.³

31
- 0000932032
- (1987) J. Am. Chem. Soc. , vol.109 , pp. 5780
- Neudorfl, P.S.¹ Lown, E.M.² Safarik, I.³ Jodhan, A.⁴ Strausz, O.P.⁵

32
- 0041872304
- (1978) Rev. Chem. Interm. , vol.2 , pp. 37
- Arthur, N.L.¹ Bell, T.N.²

33
- 0000698809
- (1995) Chem. Phys. Lett. , vol.240 , pp. 513
- Nguyen, M.T.¹ Sengupta, D.² Vanquickenborne, L.G.³

34
- 0000293645
- (1986) Organometallics , vol.5 , pp. 1521
- Rogers, D.S.¹ Ring, M.A.² O'Neal, H.E.³

35
- 0000752310
- (1983) Organometallics , vol.2 , pp. 1891
- Ring, M.A.¹ O'Neal, H.E.² Rickborn, S.F.³ Sawrey, B.A.⁴

36
- 0005747666
- (1992) Organometallics , vol.11 , pp. 983
- Harris, M.E.¹ Ring, M.A.² O'Neal, H.E.³

37
- 0000795797
- (1993) J. Chem. Soc. Faraday Trans. , vol.89 , pp. 411
- Becerra, R.¹ Frey, H.M.² Mason, B.P.³ Walsh, R.⁴

38
- 0033877665
- (2000) J. Crystal Growth , vol.211 , pp. 343
- Vorob'ev, A.N.¹ Karpov, S.Yu.² Zhmakin, A.I.³ Lovtsus, A.A.⁴ Makarov, Yu.N.⁵ Krishnan, A.⁶

39
- 0035336882
- (2001) Surf. Sci. Rep. , vol.42 , pp. 207
- Rauscher, H.¹

40
- 0032351436
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 278
- Perrin, J.¹ Shiratani, M.² Kae-Nune, P.³ Videlot, H.⁴ Jolly, J.⁵ Guillon, J.⁶

41
- 84912904790
- (1987) J. Vac. Sci. Technol. A , vol.5 , pp. 628
- Gates, S.M.¹ Scott, B.A.² Beach, D.B.³ Imbihl, R.⁴ Demuth, J.E.⁵

42
- 0001108491
- (1999) J. Appl. Phys. , vol.86 , pp. 5497
- Ramalingam, S.¹ Mahalingam, P.² Aydil, E.S.³ Maroudas, D.⁴

43
- 0000057124
- (2000) Chem. Phys. Lett. , vol.329 , pp. 304
- Walch, S.P.¹ Ramalingam, S.² Aydil, E.S.³ Maroudas, D.⁴

44
- 0000332979
- (1989) J. Appl. Phys. , vol.65 , pp. 1733
- Stinespring, C.D.¹ Wormhoudt, J.C.²

45
- 0035123031
- (2001) Mat. Sci. Forum , vol.353-356 , pp. 231
- Olander, J.¹ Larsson, K.²

46
- 0030262788
- (1996) J. Crystal Growth , vol.167 , pp. 586
- Burk A.A., Jr.¹ Rowland, L.B.²

47
- 4243411039
- (2000) Mater. Sci. Forum , vol.338-342 , pp. 169
- Kushibe, M.¹ Ishida, Y.² Okumura, H.³ Takahashi, T.⁴ Masahara, K.⁵ Ohno, T.⁶ Suzuki, T.⁷ Tanaka, T.⁸ Yoshida, S.⁹ Arai, K.¹⁰

48
- 4243612617
- (2000) Mater. Sci. Forum , vol.338-442 , pp. 1041
- Neyret, E.¹ Di Cioccio, L.² Blanquet, E.³ Raffy, C.⁴ Pudda, C.⁵ Billon, T.⁶ Camassel, J.⁷

49
- 0002193558
- (1993) J. Chem. Vap. Dep. , vol.2 , pp. 20
- Kuczmarski, M.A.¹

50
- 0003556247
- Wiley, New York, ISBN: 0-471-40065-3
- (1964) Molecular Theory of Gases and Liquids
- Hirschfelder, J.O.¹ Curtiss, C.F.² Bird, R.B.³

51
- 4043105192
- (1988) J. Appl. Phys. , vol.63 , pp. 2532
- Kushner, M.J.¹

52
- 0003845681
- Academic Press, New York, ISBN: 0-12-673842-4
- (1999) Organometallic Vapor-Phase Epitaxy-Theory and Practice, 2nd Edition
- Stringfellow, G.B.¹

53
- 0036222799
- (2002) J. Electrochem. Soc. , vol.149
- Liu, L.¹ Edgar, J.H.²

54
- 0033908930
- (2000) J. Crystal Growth , vol.208 , pp. 85
- Dauelsberg, M.¹ Kadinski, L.² Makarov, Yu.N.³ Bergunde, T.⁴ Strauch, G.⁵ Weyers, M.⁶

55
- 0005769170
- (1997) Diamond Rel. Mat. , vol.6 , pp. 1297
- Hallin, C.¹ Konstantinov, A.O.² Pécz, B.³ Kordina, O.⁴ Janzén, E.⁵

56
- 0005707714
- Linköping, private communication
- Ellison, A.¹ Okmetic, A.B.²

57
- 0032108834
- (1998) Vacuum , vol.50 , pp. 491
- Legrand, J.-C.¹ Diamy, A.-M.² Hrach, R.³ Hrachová, V.⁴

58
- 0032671050
- (1999) Plasma Sources Sci. Technol. , vol.8 , pp. 463
- Pintassilgo, C.D.¹ Loureiro, J.² Cernogora, G.³ Touzeau, M.⁴

59
- 0026139881
- (1991) IEEE Trans. Plasma Sci. , vol.19 , pp. 270
- Rhallabi, A.¹ Catherine, Y.²

60
- 0005675661
- (1994) Bull. Chem. Soc. Jpn. , vol.67 , pp. 74
- Takahashi, J.¹ Momose, T.² Shida, T.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.