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Volumn 162, Issue 1, 1997, Pages 199-225

Deep defect centers in silicon carbide monitored with deep level transient spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; COLOR CENTERS; DEEP LEVEL TRANSIENT SPECTROSCOPY; ION IMPLANTATION; RADIATION DAMAGE; SCANDIUM; SEMICONDUCTING SILICON COMPOUNDS; TITANIUM; VANADIUM;

EID: 0031188515     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(199707)162:1<199::AID-PSSA199>3.0.CO;2-0     Document Type: Article
Times cited : (471)

References (52)
  • 27
    • 0012051049 scopus 로고
    • Ed. H. R. HUFF, R. J. KRIEGLER, and Y. TAKEISHI, The Electrochem. Soc., Pennington
    • K. GRAFF and H. PIEPER, in: Semiconductor Silicon 1981, Ed. H. R. HUFF, R. J. KRIEGLER, and Y. TAKEISHI, The Electrochem. Soc., Pennington 1981 (p. 331).
    • (1981) Semiconductor Silicon 1981 , pp. 331
    • Graff, K.1    Pieper, H.2
  • 33
    • 0542408598 scopus 로고
    • Amorphous and Crystalline Silicon Carbide IV, Ed. C. Y. YANG, M. M. RAHMAN, and G. L. HARRIS, Springer-Verlag, Berlin
    • TH. STIASNY, R. HELBIG, and R. A. STEIN, in: Amorphous and Crystalline Silicon Carbide IV, Ed. C. Y. YANG, M. M. RAHMAN, and G. L. HARRIS, Springer Proc. Phys. Vol. 71, Springer-Verlag, Berlin 1992 (p. 210).
    • (1992) Springer Proc. Phys. , vol.71 , pp. 210
    • Stiasny, Th.1    Helbig, R.2    Stein, R.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.