Next-generation lithography for 22 and 16 nm technology nodes and beyond

Science China Information Sciences

Volumn 54, Issue 5, 2011, Pages 959-979

  Wu, Banqiu ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

IPL; Lithographic; NGL; NIL; XPL

Indexed keywords

EID: 79955861647     PISSN: 1674733X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11432-011-4227-6     Document Type: Review

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