Step and flash imprint lithography for manufacturing patterned media

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Brooks, Cynthia ^a   Schmid, Gerard M ^a   Miller, Mike ^a   Johnson, Steve ^a   Khusnatdinov, Niyaz ^a   Labrake, Dwayne ^a   Resniek, Douglas J ^a   Sreenivasan, S V ^a  

^a MOLECULAR IMPRINTS INC   (United States)

Author keywords

Imprint; Patterned media; S FIL; Step and flash imprint lithography; Template

Indexed keywords

IMPRINT; PATTERNED MEDIA; S-FIL; STEP AND FLASH IMPRINT LITHOGRAPHY; TEMPLATE;

DISKS (MACHINE COMPONENTS); MAGNETIC DISK STORAGE; MAGNETIC STORAGE; NANOIMPRINT LITHOGRAPHY; SUBSTRATES; TECHNOLOGY;

HARD DISK STORAGE;

EID: 67149091231     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.815016     Document Type: Conference Paper

References (15)

1. V. Poulsen, U.S. Patent No. 822, 222 (8 July 1899).
2. D. Weller and M. F. Doerner, Ann. Rev. Mater. Sci., vol.30, pp. 611-644 (2000).
3. nd ed. (Springer, NY, 2007).
4. T. Oikawa, M. Nakamura, H. Uwazumi, T. Shimatsu, H. Muraoka, and Y. Nakamura, IEEE Trans. Magn., vol.38, pp. 1976-1978 (2002).
5. S. Y. Chou, Proc. of the IEEE, vol.85, no. 4, pp. 652-671 (1997).
6. C. A. Ross, Annu. Rev. Mater. Res., vol.31, pp. 203-235 (2001).
7. D. J. Resnick, W. J. Dauksher, D. P. Mancini, K. J. Nordquist, E. S. Ainley, K. A. Gehoski, J. H. Baker, T. C. Bailey, B. J. Choi, S. C. Johnson; S. V. Sreenivasan, J. G. Ekerdt; C. Grant Willson, J. Microlithogr. Microfabrication, Microsyst, Vol.1, pp. 284-289 (2002).
8. X. Yang, S. Xiao, W. Wu, Y. Xu., K. Mountfield, R. Rottmayer, K. Lee, D. Kuo, and D. Weiler, J. Vac. Sci. Technol. B., vol.25, pp. 2202-2209 (2007).
9. M. Colburn, S. C. Johnson, M. D. Stewart, S. Damle, T. C. Bailey, B. J. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, Proc. SPIE - Emerg. Lith. Tech., vol.3676, pp. 379-389 (1999).
10. I. Yoneda, S. Mikami, T. Ota, T. Koshiba, M. Ito, T. Nakasugi, and T. Higashiki, Proc. SPIE - Emerg. Lith. Tech., vol.6921, pp. 14-21 (2008).
11. M. Miller, C. Brooks, D. Lentz, G. Doyle, D. J. Resnick, and D. LaBrake, Proc. SPIE, vol.6883 (2008).
12. M. Albrecht, C. T. Rettner, M. E. Best, and B. D. Terris, Appl. Phys. Lett., vol.83, no. 21, pp. 4363-4365 (2003).
13. 4 imprints (unpublished data).
14. M. Miller, G. M. Schmid, G. F. Doyle, E. D. Thompson, and D. J. Resnick, Microelectronic Engineering, vol.84, pp. 885-890 (2007).
15. F. Hua, Y. Sun, A. Gaur, M. Meitl, L. Bilhaut, L. Rotkina, J. Wang, P. Geil, M. Shim, and J. A. Rogers, Nano Lett., vol.4, no. 12, pp. 2467-2471 (2004).