Insertion of EUVL into high volume manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 12-18

  Silverman, P J ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Cost; EUV Lithography; EUVL; Manufacturing

Indexed keywords

COSTS; MASKS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0034763264     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436631     Document Type: Conference Paper

References (0)