Compact EUV light sources for at-wavelength metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5918, Issue , 2005, Pages 1-8

  Owens, Scott M ^a  

^a NASA GODDARD SPACE FLIGHT CENTER   (United States)

Author keywords

EUV reflectometry; EUV sources

Indexed keywords

DISCHARGE SOURCE; EUV REFLECTOMETRY; EUV SOURCES;

ASTRONOMY; DIFFRACTION GRATINGS; LIGHT EMISSION; MIRRORS; ULTRAVIOLET RADIATION; X RAYS;

LIGHT SOURCES;

EID: 30844462333     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.626177     Document Type: Conference Paper

References (8)

1. F. Paresce, S. Kumar and C. S. Bowyer, "Continuous Discharge Line Source for the Extreme Ultraviolet," Appl. Opt., 10, 1904 (1971).
2. D. S. Finley, S. Bowyer, F. Paresce and R. F. Malina, "Continuous discharge Penning source with emission lines between 50 Å and 300 Å," Appl. Opt., 18, 649 (1979).
3. A. Egbert, B. Tkachenko, S. Becker, B. N. Chichkbov, "Compact electron-based EUV source for at-wavelength metrology," Proc. SPIE, 5448 (2004).
4. Commercial products are mentioned only for clarity; mention of a product does not constitute endorsement by the authors or the US Government.
5. J. W. Brosius, R. J. Thomas, J. M. Davila, "SERTS-95 Measurements of Wavelength Shifts in Coronal Emission Lines Across a Solar Active Region," Ap. J., 526, 494-504 (1999).
6. "Facility for extreme ultraviolet reflectometry of lithography optics," C. Tarrio, S. Grantham, T. B. Lucatorto, Metrologia 40, 8229 (2003).
7. http://cfa-www.harvard.edu/amdata/ampdata/kelly/kelly.html
8. D. L. Windt, S. Donguy, J. Seely, B. Kjomrattanawanich, E. M. Gullikson, C. C. Walton, L. Golub, E. DeLuca "EUV Multilayers for Solar Physics", Proc. SPIE, 5168, 01 (2003).