MAPPER: High throughput maskless lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Wieland, M J ^a   De Boer, G ^a   Ten Berge, G F ^a   Jager, R ^a   Van De Peut, T ^a   Peijster, J J M ^a   Slot, E ^a   Steenbrink, S W H K ^a   Teepen, T F ^a   Van Veen, A H V ^a   Kampherbeek, B J ^a  

^a MAPPER Lithography BV   (Netherlands)

Author keywords

EBDW; Electron beam; Lithography; MAPPER; Maskless; Massively parallel

Indexed keywords

300 MM WAFERS; 45-NM HALF-PITCH; BEAM OPTICS; BRIDGING TECHNOLOGY; CD UNIFORMITY; CHIP-MANUFACTURING; DEVICE ENGINEERING; DOUBLE PATTERNING; EBDW; ELECTRON BEAM DIRECT WRITE; ELECTRON BEAM WRITING; EUV LITHOGRAPHY; HIGH THROUGHPUT; MAPPER; MASK WRITING; MASK-LESS LITHOGRAPHY; MASKLESS; MASSIVELY PARALLEL; OPTICAL DATA; OPTICAL LITHOGRAPHY; SEMICONDUCTOR COMPANIES; SEMICONDUCTOR INDUSTRY; TECHNICAL VIABILITY; TECHNOLOGY-BASED; TOOL PERFORMANCE;

ELECTROMAGNETIC WAVES; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; PHOTOLITHOGRAPHY; SECURITY OF DATA; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; TECHNOLOGY; THROUGHPUT; ULTRAVIOLET DEVICES;

INTEGRATED OPTOELECTRONICS;

EID: 67149116525     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814025     Document Type: Conference Paper

References (8)

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8. S.W.H.K. Steenbrink et al., High Throughput Maskless Lithography: Low Voltage versus High Voltage, Proc Spie 6921 (2008)