Enhanced performance of EUV multilayer coatings

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5900, Issue , 2005, Pages 1-4

  Louis, E ^a   Yakshin, A E ^a   Zoethout, E ^a   Van De Kruijs, R W E ^a   Nedelcu, I ^a   Van Der Westen, S Alonso ^a   Tsarfati, T ^a   Bijkerk, F ^a   Enkisch, H ^b   Mullender S ^b   Wolschrijn, B ^c   Mertens, B ^c  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

^c TNO   (Netherlands)

Author keywords

EUV Astronomy; EUV Lithography; Mo Si multilayers

Indexed keywords

ASTRONOMY; ELECTRON BEAMS; EVAPORATION; MOLYBDENUM; MULTILAYERS; PHOTOLITHOGRAPHY; SILICON; STRESS ANALYSIS; ULTRAVIOLET RADIATION;

EUV LITHOGRAPHY; EXTREME ULTRAVIOLET (EUV) ASTRONOMY; MO/SI MULTILAYERS;

OPTICAL COATINGS;

EID: 29844436350     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.616902     Document Type: Conference Paper

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