First performance results of the ASML alplia demo tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Meiling, Hans ^a   Meijer, Henk ^a   Banine, Vadim ^a   Moors, Roel ^a   Groeneveld, Regier ^a   Voorma, Harm Jan ^a   Mickan, Uwe ^a   Wolschrijn, Bas ^b   Mertens, Bas ^b   Van Baars, Gregor ^c   Kürz, Peter ^d   Harned, Noreen ^e  

^a ASML   (Netherlands)

^b TNO   (Netherlands)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

^d CARL ZEISS SMT AG   (Germany)

^e ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; DEGRADATION; OPTICAL DEVICES; PRODUCT DESIGN; CLEANING; CONTAMINATION; MICROOPTICS; PROCESS CONTROL; VACUUM;

EUV ALPHA DEMO TOOL; FUNCTIONAL LITHOGRAPHY TOOL; MITIGATION STRATEGY; TOOL PERFORMANCE; ALPHA DEMO TOOL; FUNCTIONAL LITHOGRAPHY TOOLS; OPTICS CONTAMINATION STRATEGY;

LITHOGRAPHY;

EID: 33745628745     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657348     Document Type: Conference Paper

References (12)

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2. H. Meiling, J.P.H. Benschop, U. Dinger, and P. Kürz, "Progress of the EUVL alpha tool," SPIE Symposium on Emerging Lithographic Technologies V, Vol. 4343, p. 38 (2001).
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7. rd International EUVL Symposium, Miyazaki, Japan (2004).
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9. th International EUVL Symposium, San Diego, USA (2005).
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12. th International EUVL Symposium, San Diego, USA (2005).