Pinch plasma EUV source with particle injection

Journal of Physics D: Applied Physics

Volumn 37, Issue 23, 2004, Pages 3277-3284

  McGeoch, Malcolm W ^a  

^a PLEX LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; EVAPORATION; HEAT FLUX; HEAT TRANSFER; IONIZATION; PARTICLE INJECTORS; PARTICLE SIZE ANALYSIS; PHOTOEMISSION; PLASMA DENSITY; ULTRAVIOLET RADIATION;

DROPLET MASS; EXTREME ULTRAVIOLET (EUV) SOURCES; GAS DISCHARGE PLASMAS (GDP); SECONDARY ELECTRON EMISSION;

PLASMA SOURCES;

EID: 10644222785     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/23/008     Document Type: Article

References (25)

1. McGeoch M W 1998 Appl. Opt. 37 1651
2. Klosner M A and Silfvast W T 1998 Opt. Lett. 23 1609
3. Partlo W, Fomenkov I and Birx D 1999 Proc. SPIE 3676 846
4. Bergmann K, Schriever G, Rosier O, Muller M, Neff W and Lebert R 1999 Appl. Opt. 38 5413
5. McGeoch M W and Pike C T 2003 Proc. SPIE 5037 141
6. McGeoch M W 2005 Extreme Ultraviolet Sources (Bellingham, WA: SPIE Press) chapter 3.4
7. McGeoch M W 2004 Int. Sematech Workshop on Extreme Ultraviolet Sources (Santa Clara, February 2004)
8. Pankert J 2004 Int. Sematech Workshop on Extreme Ultraviolet Sources (Santa Clara, February 2004)
9. Borisov V M 2004 Int. Sematech Workshop on Extreme Ultraviolet Sources (Santa Clara, February 2004)
10. Fomenkov I 2004 Int. Sematech Workshop on Extreme Ultraviolet Sources (Santa Clara, February 2004)
11. Meiling H, Benschop J, Dinger U and Kurz P 2001 Proc. SPIE 4343 38
12. Derra G and Singer W 2003 Proc. SPIE 5037 728
13. Richardson M, Koay C-S, Takenoshita K, Keyser C and Al-Rabban M 2004 J. Vac. Sci. Technol. B 22 785
14. McGeoch M 2004 US Patent Application
15. Meiling H, Banine V, Kurz P and Harned N 2004 Proc. SPIE 5374 31
16. O'Sullivan G 2004 Int. Sematech Workshop on Extreme Ultraviolet Sources (Antwerp, September 2004)
17. Kelly R L 1987 J. Phys. Chem. Ref. Data 16 (Suppl. 1) 386-412
18. Kieft E R, van der Mullen J, Kroesen G M W and Banine V 2003 Phys. Rev. E 68 056403
19. Fomenkov I V, Partlo W N, Ness R M, Oliver I R, Melnychuk S T, Khodykin O V, Böwering N R, Rettig C L and Hoffman J R 2005 Extreme Ultraviolet Sources (Bellingham, WA: SPIE Press) chapter 3.1
20. Gillaspy J private communication
21. Henke B L, Knauer J P and Premaratne K 1981 J. Appl. Phys. 52 1509
22. Hartmann W, Dominic V, Kirkman G F and Gundersen M A 1988 Appl. Phys. Lett. 53 1699
23. Hartmann W, Dominic V, Kirkman G F and Gundersen M A 1989 J. Appl. Phys. 65 4388
24. Schottky W 1923 Z. Phys. 14 63
25. Aumayr F and Winter H 2004 Phil. Trans. R. Soc. A 362 77