Optimization of a dense plasma focus device as a light source for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 634-647

  Fomenkov, Igor V ^a   Partlo, William N ^a   Ness, Richard M ^a   Oliver, I Roger ^a   Melnychuk, Stephan T ^a   Khodykin, Oleh V ^a   Böwering, Norbert R ^a  

^a CYMER INC   (United States)

Author keywords

Dense Plasma Focus; EUV light source; EUV Lithography; Xe emission

Indexed keywords

HEAT FLUX; IONIZATION; LIGHT SOURCES; PLASMA DEVICES; THERMAL CONDUCTIVITY;

DENSE PLASMA FOCUS DEVICES; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0036378853     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472339     Document Type: Conference Paper

References (9)

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