EUV sources for EUV lithography in alpha-, beta- and high volume chip manufacturing: An update on GDPP and LPP technology

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 236-247

  Stamm, U ^a   Kleinschmidt, J ^a   Gabel K ^b   Hergenhan, G ^b   Ziener, C ^b   Schriever, G ^a   Ahmad, I ^a   Bolshukhin, D ^a   Brudermann, J ^a   De Bruijn, R ^a   Chin, T D ^a   Geier, A ^a   Gotze S ^a   Keller, A ^a   Korobotchko, V ^a   Mader, B ^a   Ringling, J ^a   Brauner, T ^c  

^a XTREME Technologies   (Germany)

^b XTREME Technologies   (Germany)

^c FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

EUV lithography; EUV sources; Gas discharge produced plasma; Laser produced plasma; Z pinch

Indexed keywords

COOLING; ELECTRONIC EQUIPMENT MANUFACTURE; LASER BEAMS; LASER PRODUCED PLASMAS; ULTRAVIOLET RADIATION; XENON;

EUV LITHOGRAPHY; EUV SOURCES; GAS DISCHARGE PRODUCED PLASMA; Z-PINCH;

LITHOGRAPHY;

EID: 24644492299     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599544     Document Type: Conference Paper

References (7)

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