Capella: A kHz and low debris capillary discharge EUV source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 672-679

  Robert, E ^a   Gonthiez, T ^a   Sarroukh, O ^a   Thomann, A L ^a   Viladrosa, R ^a   Fleurier, C ^a   Pouvesle, J M ^a   Cachoncinlle, C ^a  

^a UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

Capillary discharge source; EUV imaging; EUV lamp; EUV lithography; EUV source; EUV spectroscopy; Plasma discharge source

Indexed keywords

DISCHARGE LAMPS; IMAGING TECHNIQUES; LIGHT SOURCES; MASKS; PLASMA SOURCES; ULTRAVIOLET SPECTROSCOPY;

CAPILLARY DISCHARGE SOURCES;

PHOTOLITHOGRAPHY;

EID: 0036380224     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472276     Document Type: Article

References (6)

1. Microlithography 2002, invited paper 4688-08, March 5, 2002.
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3. S.R. Mohanty et al., submited to Micro Nanotechnology Engineering.
4. E. Robert et al., Proceedings of SPIE, 4343, pp. 566-575, 2001.
5. N. R. Fornaciari et al., Proceedings of SPIE, 3997, pp. 120-125, 2000.
6. N. R. Fornaciari et al., Proceedings of SPIE, 4343, pp. 226-231, 2001.