Initial results from the EUV engineering test stand

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4506, Issue , 2001, Pages 9-18

  Tichenor, Daniel A ^a   Ray Chaudhuri, Avijit K ^a   Lee, Sang H ^e   Chapman, Henry N ^c   Replogle, William C ^a   Berger, Kurt W ^a   Stulen, Richard H ^a   Kubiak, Glenn D ^a   Klebanoff, Leonard E ^a   Wronosky, John B ^b   O'connell, Donna J ^a   Leung, Alvin H ^a   Jefferson, Karen L ^a   Ballard, William P ^a   Hale, Layton C ^c   Blaedel, Kenneth ^c   Taylor, John S ^c   Folta, James A ^c   Spiller, Eberhard ^c   Soufli, Regina ^c   Sommargren, Gary E ^c   Sweeney, Donald W ^c   Naulleau, Patrick ^d   Goldberg, Kenneth A ^d   Gullikson, Eric M ^d   Bokor, Jeffrey ^d   Attwood, David T ^d   Mickan, Uwe ^f   Hanzen, Ralph ^f   Panning, Eric ^e   Yan, Pei Yang ^e   Bjorkholm, John E ^e   Gwyn, Charles W ^e   more..

^a SANDIA NATIONAL LABORATORIES   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^e INTEL CORPORATION   (United States)

^f ASML   (Netherlands)

Author keywords

EUVL; Laser plasma source; Laser produced plasma; Lithography

Indexed keywords

FOCUSING; IMAGE ANALYSIS; IMAGE QUALITY; IMAGING SYSTEMS; INTERFEROMETRY; LASER PRODUCED PLASMAS; LIGHTING; LITHOGRAPHY; NEODYMIUM LASERS; PLASMA SOURCES; PROJECTION SYSTEMS; SCANNING; VACUUM APPLICATIONS;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

ULTRAVIOLET RADIATION;

EID: 0001166658     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.450953     Document Type: Article

References (8)

1. D.A. Tichenor, A.K. Ray-Chaudhuri, W.C. Replogle, R.H. Stulen, G.D. Kubiak, P.D. Rockett, L.E. Klebanoff, K.L. Jefferson, A.H. Leung, J.B. Wronosky, L.C. Hale, H.N. Chapman, J.S. Taylor, J.A. Folta, C. Montcalm, R. Soufli, E. Spiller, K. Blaedel, G.E. Sommargren, D.W. Sweeney, P. Naulleau, K.A. Goldberg, E.M. Gullikson, J. Bokor, P.J. Batson, D.T. Attwood, K.H. Jackson, S.D. Hector, C.W. Gwyn, and P.Y. Yan, "System Integration and Performance of the EUV Engineering Test Stand," Emerging Lithographic Technologies V, Proceeding of SPIE, 4343, pp. 19-37, 2001.
2. H.N. Chapman, A.K. Ray-Chaudhuri, D.A. Tichenor, W.C. Replogle, R.H. Stulen, G.D. Kubiak, P.D. Rockett, L.E. Klebanoff, D. O'Connell, A.H. Leung, K.L. Jefferson, J.B. Wronosky, J.S. Taylor, L.C. Hale, K. Blaedel, E. Spiller, G.E. Sommargren, J.A. Folta, D.W. Sweeney, E.M. Gullikson, P. Naulleau, K.A. Goldberg, J. Bokor, D.T. Attwood, U. Mickan, R. Hanzen, E. Panning, P.-Y. Yan, C.W. Gwyn, and S.H. Lee, "First Lithographic Results from the EUV Engineering Test Stand," submitted to J. Vac. Sci. 2001.
3. K.W. Berger and R.H. Campiotti, "Absolute Dosimetry for Extreme Ultraviolet Lithography," Metrology, Inspection, and Process Control for Microlithography XIV, Proceedings of SPIE, 3998, pp. 838-845, 2000.
4. G.D. Kubiak, L.J. Bernardez, K. Krenz, W.C. Replogle, W.C. Sweatt, D.W. Sweeney, R.M. Hudyma, and H. Shields, "High-power source and illumination system for extreme ultraviolet lithography," Proceedings of the SPIE 3767, p. 136, 1999.
5. P.D. Rockett, J.A. Hunter, G.D. Kubiak, K. Krenz, H. Shields, and M. Powers, "Detailed EUV Characterization of Laser-Plasma Sources for EUV Lithography," OSA Proceedings on Extreme Ultraviolet Lithography, F. Zernike and D.T. Attwood, eds. 23, pp. 255-259, 1994.
6. P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J, Bokor, "At wavelength characterization of the Engineering Test Stand Set-2 optic," submitted to J. Vac. Sci. & Technol. B, 2001.
7. P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J. Bokor, "Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer," Emerging Lithographic Technologies V, Proceeding of SPIE, 4343, pp. 639-645, 2001.
8. D. Attwood, P. Naulleau, K. Goldberg, E. Tejnil, C. Chang, R. Beguiristain, P. Batson, J. Bokor, E. Gullikson, H. Medecki, and J. Underwood, "Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions," IEEE J. Quantum Electron. 35, pp. 709-720, 1999.