SCOPUS 정보 검색 플랫폼

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

Inspection of imprint lithography patterns for semiconductor and patterned media

(10) Resnick, Douglas J a Haase, Gaddi a Singh, Lovejeet a Curran, David a Schmid, Gerard M a Luo, Kang a Brooks, Cindy a Selinidis, Kosta a Fretwell, John a Sreenivasan, S V a

a MOLECULAR IMPRINTS INC (United States)

Author keywords

defectivity; electron beam inspection; imprint lithography; imprint mask; J FIL; jet and flash imprint lithography; optical inspection; template

Indexed keywords

DEFECTIVITY; ELECTRON BEAM INSPECTIONS; FLASH IMPRINT LITHOGRAPHY; IMPRINT LITHOGRAPHY; IMPRINT MASK; OPTICAL INSPECTION;

DISKS (STRUCTURAL COMPONENTS); ELECTRON BEAMS; INSPECTION EQUIPMENT; MACHINE TOOLS; NANOIMPRINT LITHOGRAPHY; OPTICAL PROPERTIES; OPTICAL TESTING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SOFTWARE TESTING; SURFACE DEFECTS;

INSPECTION;

EID: 77953305689 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.848391 Document Type: Conference Paper

Times cited : (9)

References (13)

1
- 0032625408
- Emerging Lithographic Technologies III
- M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, Proc. SPIE, Emerging Lithographic Technologies III, 379 (1999).
- (1999) Proc. SPIE , pp. 379
- Colburn, M.¹ Johnson, S.² Stewart, M.³ Damle, S.⁴ Bailey, T.⁵ Choi, B.⁶ Wedlake, M.⁷ Michaelson, T.⁸ Sreenivasan, S.V.⁹ Ekerdt, J.¹⁰ Willson, C.G.¹¹

2
- 0035397511
- June
- M. Colburn, T. Bailey, B. J. Choi, J. G. Ekerdt, S. V. Sreenivasan, Solid State Technology, 67, June 2001.
- (2001) Solid State Technology , pp. 67
- Colburn, M.¹ Bailey, T.² Choi, B.J.³ Ekerdt, J.G.⁴ Sreenivasan, S.V.⁵

3
- 4243591197
- T. C. Bailey, D. J. Resnick, D. Mancini, K. J. Nordquist, W. J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J. H. Baker, B. J. Choi, S. Johnson, M. Colburn, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, Microelectronic Engineering 61-62 (2002) 461-467.
- (2002) Microelectronic Engineering , vol.61-62 , pp. 461-467
- Bailey, T.C.¹ Resnick, D.J.² Mancini, D.³ Nordquist, K.J.⁴ Dauksher, W.J.⁵ Ainley, E.⁶ Talin, A.⁷ Gehoski, K.⁸ Baker, J.H.⁹ Choi, B.J.¹⁰ Johnson, S.¹¹ Colburn, M.¹² Sreenivasan, S.V.¹³ Ekerdt, J.G.¹⁴ Willson, C.G.¹⁵

4
- 62649143642
- R. S. Sasaki, T. Hiraka, J. Mizuochi, A. Fujii, Y. Sakai, T. Sutou, S. Yusa, K. Kuriyama, M. Sakaki, Y. Morikawa, H. Mohri, N. Hayashi, Proc. SPIE Vol. 7122, 71223P (2008).
- (2008) Proc. SPIE , vol.7122
- Sasaki, R.S.¹ Hiraka, T.² Mizuochi, J.³ Fujii, A.⁴ Sakai, Y.⁵ Sutou, T.⁶ Yusa, S.⁷ Kuriyama, K.⁸ Sakaki, M.⁹ Morikawa, Y.¹⁰ Mohri, H.¹¹ Hayashi, N.¹²

5
- 77953314624
- presented at the
- S.V. Sreenivasan, P. Schumaker, B. Mokaberi-Nezhad, J. Choi, J. Perez, V. Truskett, F. Xu, X, Lu, presented at the SPIE Advanced Lithography Symposium, Conference 7271, 2009.
- (2009) SPIE Advanced Lithography Symposium Conference , pp. 7271
- Sreenivasan, S.V.¹ Schumaker, P.² Mokaberi-Nezhad, B.³ Choi, J.⁴ Perez, J.⁵ Truskett, V.⁶ Xu, F.⁷ Lu, X.⁸

6
- 42149139643
- K. Selenidis, J. Maltabes, I. McMackin, J. Perez, W. Martin, D. J. Resnick, S.V. Sreenivasan, Proc. SPIE Vol. 6730, 67300F-1, 2007.
- (2007) Proc. SPIE , vol.6730
- Selenidis, K.¹ Maltabes, J.² McMackin, I.³ Perez, J.⁴ Martin, W.⁵ Resnick, D.J.⁶ Sreenivasan, S.V.⁷

7
- 3843107899
- I. McMackin, J. Choi, P. Schumaker, V. Nguyen, F. Xu, E. Thompson, D. Babbs, S. V. Sreenivasan, M. Watts, and N. Schumaker, Proc. SPIE 5374, 222 (2004).
- (2004) Proc. SPIE , vol.5374 , pp. 222
- McMackin, I.¹ Choi, J.² Schumaker, P.³ Nguyen, V.⁴ Xu, F.⁵ Thompson, E.⁶ Babbs, D.⁷ Sreenivasan, S.V.⁸ Watts, M.⁹ Schumaker, N.¹⁰

8
- 24644512206
- L. Jeff Myron, L. Gershtein, G. Gottlieb, B. Burkhardt, A. Griffiths, D. Mellenthin, K. Rentzsch, S. MacDonald, G. Hughes, Proc. SPIE 5752, 384-391, (2005).
- (2005) Proc. SPIE , vol.5752 , pp. 384-391
- Jeff Myron, L.¹ Gershtein, L.² Gottlieb, G.³ Burkhardt, B.⁴ Griffiths, A.⁵ Mellenthin, D.⁶ Rentzsch, K.⁷ MacDonald, S.⁸ Hughes, G.⁹

9
- 77953301257
- Santa Clara, CA
- B.J. Choi, et al; SPIE Intl. Symp. Microlithography: Emerging Lithographic Technologies, 2001 Santa Clara, CA.
- (2001) SPIE Intl. Symp. Microlithography: Emerging Lithographic Technologies
- Choi, B.J.¹

10
- 77953315483
- G. M. Schmid, C. Brooks, Z. Ye, S. Johnson, D. LaBrake, S. V. Sreenivasan, and D. J. Resnick, Proc. SPIE 7488, 748820 (2009).
- (2009) Proc. SPIE , vol.7488 , pp. 748820
- Schmid, G.M.¹ Brooks, C.² Ye, Z.³ Johnson, S.⁴ LaBrake, D.⁵ Sreenivasan, S.V.⁶ Resnick, D.J.⁷

11
- 77953298044
- H. Xiao, L. Ma, F. Wang, Y. Zhao, J. Jau, K. Selinidis, E. Thompson, S. V. Sreenivasan, and D. J. Resnick, Proc. SPIE 7488, 74881V (2009).
- (2009) Proc. SPIE , vol.7488
- Xiao, H.¹ Ma, L.² Wang, F.³ Zhao, Y.⁴ Jau, J.⁵ Selinidis, K.⁶ Thompson, E.⁷ Sreenivasan, S.V.⁸ Resnick, D.J.⁹

12
- 62649113854
- Emerging Lithographic Technologies XII
- Frank M. Schellenberg, Editors
- I. McMackin; J. Perez; K. Selinidis; J. Maltabes; D. Resnick; S. V. Sreenivasan, Proc. SPIE 6921, Emerging Lithographic Technologies XII, Frank M. Schellenberg, Editors, 69211L, 2008.
- (2008) Proc. SPIE , vol.6921
- McMackin, I.¹ Perez, J.² Selinidis, K.³ Maltabes, J.⁴ Resnick, D.⁵ Sreenivasan, S.V.⁶

13
- 77953297695
- Toward Automated Pattern Inspection and Defect Characterization for Patterned Media Lithography
- presented at
- rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication" on May 28, 2009.
- rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication on May 28, 2009
- Schmid, G.M.¹ Khusnatdinov, N.² Luo, K.³ Fretwell, J.⁴ Wada, H.⁵ Resnick, D.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.