Photoresist film thickness for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 588-599

  Dentinger, Paul ^a   Cardinale, Greg ^a   Henderson, Craig ^a   Fisher, Aaron ^a   Ray Chaudhuri, Avi ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; COMPUTER SIMULATION; CRYSTAL DEFECTS; LIGHT ABSORPTION; SEMICONDUCTING FILMS; ULTRAVIOLET RADIATION;

ATOMIC EXTINCTION COEFFICIENTS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); SPIN COATING;

PHOTORESISTS;

EID: 0033720560     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)