Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 2, 2004, Pages 943-952

  Tejnil, Edita ^a   Gullikson, Eric ^b   Stivers, Alan ^a  

^a INTEL CORPORATION   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Confocal imaging, surface roughness; Extreme ultraviolet lithography; Mask blank inspection

Indexed keywords

IMAGE ANALYSIS; IMAGING TECHNIQUES; INSPECTION; LIGHT REFLECTION; MASKS; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; SENSITIVITY ANALYSIS; SUBSTRATES; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

CONFOCAL IMAGING; DEFECT INSPECTION; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MASK BLANK INSPECTION;

DEFECTS;

EID: 19844377035     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569849     Document Type: Conference Paper

References (8)

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