Physical properties of the HCT EUV source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 112-118

  Pankert, Joseph ^b   Bergmann, Klaus ^a   Klein, Jürgen ^a   Neff, Willi ^a   Rosier, Oliver ^a   Seiwert, Stefan ^a   Smith, Christopher ^a   Probst, Sven ^a   Vaudrevange, Dominik ^b   Siemons, Guido ^b   Apetz, Rolf ^b   Jonkers, Jeroen ^b   Loeken, Michael ^b   Bosch, Eric ^b   Derra, Günther ^b   Krücken, Thomas ^b   Zink, Peter ^b  

^a FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^b PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

EUV lithography; EUV source; Gas discharge plasma

Indexed keywords

CATHODES; EFFICIENCY; ELECTRIC DISCHARGES; FREQUENCIES; PHYSICAL PROPERTIES; PLASMAS; SILICON WAFERS; TIN; ULTRAVIOLET RADIATION; XENON;

EXTREME ULTRAVIOLET LITHOGRAPHY; GAS DISCHARGE PLASMA; HOLLOW CATHODE; INBAND RADIATION; REPETITION FREQUENCY;

LITHOGRAPHY;

EID: 0141501438     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483611     Document Type: Conference Paper

References (7)

1. V. Banine, R. Moers, Proc. SPIE 2001, Vol. 4343, p. 203-214
2. K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, R. Lebert; Appl. Opt. 38, 5413-5417 (1999)
3. K. Bergmann, O. Rosier, W. Neff, R. Lebert: Appl. Opt. 39, 3833-3837 (2000)
4. G. Herziger, W. Neff, R. Lebert, German Patent DE 3942307 (1989)
5. G. Derra, W. Singer: Collection efficiency of EUV sources, SPIE Microlithography 2003, March 23-28, 2003, Santa Clara
6. T. Miyamoto, Analysis of High-Density Z-Pinches by a Snowplough Energy Equation, Nuclear Fusion 24, 337 (1984)
7. H. Summers et al., Atomic Data and its Utilisation at the Jet experiment, Plenum Press Series Physics of Photons and Molecules, Photon and electron collisions with atoms and molecules, edited by P.G. Burke, C.J. Joachain (1997), page 265.