Progress in the ASML EUV program

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 31-42

  Meiling, Hans ^a   Banine, Vadim ^a   Kürz, Peter ^b   Harned, Noreen ^c  

^a ASML   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

^c ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FREQUENCY DOMAIN ANALYSIS; IMAGING TECHNIQUES; MASKS; MECHATRONICS; MULTILAYERS; OXIDATION; RISK ASSESSMENT; SENSITIVITY ANALYSIS;

ENVIRONMENTAL CONTROL; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); REFLECTIVE OPTICS TECHNOLOGY;

LITHOGRAPHY;

EID: 3843104638     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534784     Document Type: Conference Paper

References (17)

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