Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Teramoto, Yusuke ^a   Niimi, Gohta ^a   Yamatani, Daiki ^a   Joshima, Yuki ^a   Bessho, Kazunori ^a   Shirai, Takahiro ^a   Takemura, Tetsu ^a   Yokota, Toshio ^a   Yabuta, Hironobu ^a   Paul, Khokan C ^b   Kabuki, Kiyoyuki ^a   Miyauchi, Koji ^a   Ikeuchi, Mitsuru ^a   Hotta, Kazuaki ^a   Yoshioka, Masaki ^a   Sato, Hiroto ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

^b USHIO INC   (Japan)

Author keywords

DPP; EUV source; Lithography; Pulsed power; Tin; Xenon; Z pinch

Indexed keywords

GAS FUELS; INTERFACES (MATERIALS); LITHOGRAPHY; PULSE GENERATORS; PULSE TIME MODULATION; RADIATION; TIN; XENON;

DISCHARGE-PRODUCED PLASMAS (DPP); EUV SOURCES; PULSED POWER; Z-PINCH;

PLASMAS;

EID: 33745621865     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657272     Document Type: Conference Paper

References (11)

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