Step and flash imprint lithography for semiconductor high volume manufacturing?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Malloy, M ^a   Litt, L C ^a  

^a SEMATECH   (United States)

Author keywords

HVM; Nanoimprint; NIL; SFIL; Step and Flash; UV NIL

Indexed keywords

CRITICAL ISSUES; CURRENT STATUS; DEFECTIVITY; HIGH VOLUME MANUFACTURING; INDUSTRY COLLABORATION; INTEGRATION ISSUES; NANO-IMPRINT; NEXT GENERATION LITHOGRAPHY; RESOLUTION REQUIREMENTS; STEP-AND-FLASH IMPRINT LITHOGRAPHY; ULTRAVIOLET-NANOIMPRINT LITHOGRAPHY;

SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES;

NANOIMPRINT LITHOGRAPHY;

EID: 77953310489     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846617     Document Type: Conference Paper

References (6)

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