Synthesis and evaluation of novel organoelement resists for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1164-1172

  Dai, Junyan ^a   Ober, Christopher K ^a   Kim, Sang Ouk ^b   Nealey, Paul ^b   Golovkina, Victoria ^b   Shin, Jangho ^b   Wang, Lin ^b   Cerrina, Franco ^b  

^a School of Operations Research and Industrial Engineering   (United States)

^b Wisconsin Electric Machines and Power Electronics Consortium   (United States)

Author keywords

Boron containing resists; EUV lithography; EUV resists; Ling edge roughness; Silicon containing resists

Indexed keywords

BORON; CARBOXYLIC ACIDS; COPOLYMERS; ETCHING; INTERFEROMETRY; LITHOGRAPHY; OXYGEN; SILICON; SURFACE ROUGHNESS;

ETCH RESISTANCE; LINE EDGE ROUGHNESS; ORGANOELEMENT; SILICON CONTAINING POLYMERS;

PHOTORESISTS;

EID: 0141722646     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485116     Document Type: Conference Paper

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