Thermo-curable epoxy systems for nanoimprint lithography

Journal of Micromechanics and Microengineering

Volumn 20, Issue 1, 2010, Pages

  Wu, Chun Chang ^a   Hsu, Steve Lien Chung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BRITTLE FAILURES; CURING KINETICS; DIGLYCIDYL ETHER OF BISPHENOL-A; EPOXY SYSTEMS; HIGH-DENSITY; HIGHLY DENSE; ISOTHERMAL DSC; MICRO-SCALES; RESIST MATERIALS; SILICON MOLDS; SOLVENT FREE; TEREPHTHALATE; UV CURABLE;

CURING; ETHERS; ETHYLENE; MOLDS; NANOIMPRINT LITHOGRAPHY; PHENOLS; RESINS; TIN;

EPOXY RESINS;

EID: 71949115057     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/1/015006     Document Type: Article

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