Options for at-wavelength inspection of patterned extreme ultraviolet lithography masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873 (I, Issue , 1999, Pages 792-803

  Tejnil, Edita ^a   Stivers, Alan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INSPECTION; LIGHT SOURCES; PHOTOLITHOGRAPHY;

AT-WAVELENGTH INSPECTION; EXTREME ULTRAVIOLET LITHOGRAPHY MASK;

MASKS;

EID: 0033331476     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373373     Document Type: Conference Paper

References (21)