Magnetron sputtered EUV mirrors with high thermal stability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 420-430

  Feigl, T ^a   Yulin, S ^a   Kaiser, N ^a   Thielsch, R ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBIDES; LIGHT REFLECTION; MAGNETRON SPUTTERING; MIRRORS; MOLYBDENUM; MOLYBDENUM COMPOUNDS; OPTICAL MULTILAYERS; SILICON; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0033701342     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)