50 keV electron-beam projection maskless lithography (PML2): Results obtained with 2,500 programmable 12.5-nm sized beams

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Klein, Christof ^a   Klikovits, Jan ^a   Szikszai, Laszlo ^a   Platzgummer, Elmar ^a   Loeschner, Hans ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

electron beam projection optics; maskless lithography; multi beam; programmable aperture plate system

Indexed keywords

BEAM ENERGIES; DEMAGNIFICATION; ELECTRON-BEAM PROJECTION; MASK-LESS LITHOGRAPHY; MULTI-BEAM; PRODUCTION TOOLS; PROGRAMMABLE APERTURE PLATES; PROJECTION MASK-LESS LITHOGRAPHIES; SPOT SIZES; TECHNOLOGY NODES; TEST-BENCH; WAFER LEVEL; WAFER SURFACE;

ELECTRON BEAMS; ELECTRONS; TECHNOLOGY;

ELECTRON BEAM LITHOGRAPHY;

EID: 77953316284     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846544     Document Type: Conference Paper

References (1)

1. Elmar Platzgummer, "Maskless lithography and nanopatterning with electron and ion multi-beam projection", Proc. SPIE 7637, paper 7637-02 (2010).