Star pinch scalable EUV source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 141-146

  McGeoch, Malcolm W ^a   Pike, Charles T ^a  

^a PLEX LLC   (United States)

Author keywords

Extreme; Pinch; Scalable; Source; Star; Ultraviolet; Xenon

Indexed keywords

ANODES; BANDWIDTH; CATHODES; ELECTRIC DISCHARGES; LASER PULSES; LIGHT SOURCES; PLASMAS; SURFACES; THROUGHPUT; ULTRAVIOLET RADIATION; XENON;

EXTREME ULTRAVIOLET; PINCH; SCALABLE; STAR;

LITHOGRAPHY;

EID: 0141724825     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484932     Document Type: Conference Paper

References (14)

1. M. W. McGeoch, Appl. Opt., 37, pp1651-1658, (1998).
2. K. Bergmann, G. Schriever, O. Rosier, M. Muller, W. Neff and R. Lebert, Appl. Opt. 38, pp55413-5417 (1999)
3. V.M. Borisov et al. Proc. SPIE 4688, pp626-633 (2002).
4. I. Fomenkov et al. Proc. SPIE 4688, pp634-647 (2002).
5. N.R. Fornaciari et al. Proc. SPIE 4688, pp110-121 (2002).
6. D. Rosenberg and D.K. Wehner, J Appl. Phys. 33, pp. 1842-1845 (1962).
7. M. McGeoch, "Star Pinch X-Ray and Extreme Ultraviolet Photon Source" US Patent to issue 2003.
8. B.I. Kikiani et al, Am. Inst. Phys. Sov. Phys. Tech. Phys. 20 (3) pp364-367 (1975).
9. F. Bijkerk, FoM., NL.
10. I.R.D., Inc., Torrance, CA, USA.
11. Scientech Engineering, Almere-Haven, NL.
12. M. Kroon and R. Stuik, Proc. SPIE 4343, pp665-675 (2001).
13. Marketech Intl., Port Townsend, WA, USA.
14. A. Hassanein et al., Proc. SPIE Symp. Microlithography, Santa Clara Mar. 2003, paper 5037-47