Verification studies of thermophoretic protection for extreme ultraviolet masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 1, 2005, Pages 307-317

  Dedrick, Daniel E ^a   Beyer, Eric W ^a   Rader, Daniel J ^a,b   Klebanoff, Leonard E ^a   Leung, Alvin H ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GAS PRESSURE; THERMOPHORETIC PROTECTION;

COMPUTER SIMULATION; PHOTOLITHOGRAPHY; SILICON WAFERS; THERMAL GRADIENTS; THERMOPHORESIS;

MASKS;

EID: 28444467060     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1856463     Document Type: Article

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