Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 678-686

  Kim, Seong Sue ^a   Chalyck, Roman ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IMAGE ANALYSIS; LIGHT ABSORPTION; LIGHT SCATTERING; MULTILAYERS; ULTRAVIOLET RADIATION; WAVE EFFECTS;

DEFECT INSPECTION; MULTILAYER STRUCTURE; PHASE DEFECTS; RIGOROUS COUPLED-WAVE ANALYSIS (RCWA);

MASKS;

EID: 24644462232     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600459     Document Type: Conference Paper

References (10)

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