Verification studies of thermophoretic protection for EUV masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 182-193

  Rader, Daniel J ^a   Dedrick, Daniel E ^a   Beyer, Eric W ^a   Leung, Alvin H ^a   Klebanoff, Leonard E ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

EUV lithography; Particle contamination control; Thermophoresis; Thermophoretic pellicle

Indexed keywords

MASKS; PHOTOLITHOGRAPHY; POLYSTYRENES; THERMOPHORESIS;

NEXT GENERATION LITHOGRAPHY (NGL) TECHNOLOGY;

ULTRAVIOLET RADIATION;

EID: 0036380443     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472288     Document Type: Article

References (10)

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