System architecture choices for an advanced mask writer (100-130 nm)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 228-242

  Chakarian, Varoujan ^a   Raymond III, Frederick ^a   Sauer, Charles ^a   Babin, Sergey ^a   Innes, Robert ^a   Sagle, Allan ^a   Hofmann, Ulrich ^a   Shamoun, Bassam ^a   Trost, David ^a   Ghanbari, Abe ^a   Abboud, Frank ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON BEAMS; INSTRUMENT SCALES; MATERIALS HANDLING; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SPATIAL VARIABLES CONTROL; TEMPERATURE CONTROL;

CRITICAL DIMENSION; MASK WRITER; RESIST HEATING; RETICLES; SYSTEM ARCHITECTURE;

MASKS;

EID: 0033338043     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373318     Document Type: Conference Paper

References (22)