First lithographic results from the extreme ultraviolet engineering test stand

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2389-2395

  Chapman, H N ^a   Ray Chaudhuri, A K ^b,g   Tichenor, D A ^b   Replogle, W C ^b   Stulen, R H ^b   Kubiak, G D ^b   Rockett, P D ^b   Klebanoff, L E ^b   O'Connell, D ^b   Leung, A H ^b   Jefferson, K L ^b   Wronosky, J B ^c   Taylor, J S ^a   Hale, L C ^a   Blaedel, K ^a   Spiller, E A ^a   Sommargren, G E ^a   Folta, J A ^a   Sweeney, D W ^a   Gullikson, E M ^d   Naulleau, P ^d   Goldberg, K A ^d   Bokor, J ^d   Attwood, D T ^d   Mickan, U ^e   Hanzen, R ^e   Panning, E ^f   Yan, P Y ^f   Gwyn, C W ^f   Lee, S H ^f   more..

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^e ASML   (Netherlands)

^f INTEL CORPORATION   (United States)

^g KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING SYSTEMS; IMAGING TECHNIQUES; MATHEMATICAL MODELS; PROJECTION SYSTEMS; SCANNING; ULTRAVIOLET RADIATION;

ENGINEERING TEST STAND; EXTREME ULTRAVIOLET; ILLUMINATOR; IMAGE MODELLING; LITHOGRAPHIC MODELS; PROJECTION OPTICS;

PHOTOLITHOGRAPHY;

EID: 0000348572     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1414017     Document Type: Article

References (9)

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2. P. Naulleau, K. A. Goldberg, P. Batson, S. Rekawa, P. Denham, and J. Bokor, J. Vac. Sci. Technol. B, these proceedings.
3. D. W. Sweeny, R. Hudyma, H. N. Chapman, and D. Shafer, Proc. SPIE 3331, 2 (1998).
4. S. Hector and P. Mangat, J. Vac. Sci. Technol. B, these proceedings.
5. G. D. Kubiak, L. J. Bernardez, K. Krenz, and W. C. Sweatt, Proc. SPIE 3676, 669 (1999).
6. W. C. Sweatt, in OSA Proceedings on Soft X-Ray Projection Lithography, edited by A. M. Hawryluk and R. H. Stulen, 1994, Vol. 18, pp. 70-72.
7. K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, E. Anderson, H. Chapman, and J. Bokor, J. Vac. Sci. Technol. B 18, 2911 (2000).
8. D. G. Stearns, D. P. Gaines, D. W. Sweeney, and E. M. Gullikson, J. Appl. Phys. 84, 1002 (1998).
9. J. B. Wronosky et al., Proc. SPIE 3997, 829 (2000).