-
1
-
-
3042742547
-
-
6 (2003), p G101-4, G. Levitin, S. Myneni, D.W. Hess, Cleaning Technology in Semiconductor Device Manufacturing, The Electrochemical Society Proceedings
-
G. Levitin, S. Myneni, D.W. Hess: Electrochemical and Solid-State Letters 6 (2003), p G101-4, G. Levitin, S. Myneni, D.W. Hess, Cleaning Technology in Semiconductor Device Manufacturing, The Electrochemical Society Proceedings 26, (2003) p.263-270.
-
(2003)
Electrochemical and Solid-State Letters
, vol.26
, pp. 263-270
-
-
Levitin, G.1
Myneni, S.2
Hess, D.W.3
-
2
-
-
3042783240
-
Electrochemical Society Proceedings
-
R.B. Turkot Jr., V.S. RamachandraRao, S.A. Iyer, S.C. Clark: Electrochemical Society Proceedings, v 25, Cleaning Technology in Semiconductor Device Manufacturing VII - Proceedings of the International Symposium 2003, p 254-262.
-
(2003)
Cleaning Technology in Semiconductor Device Manufacturing VII - Proceedings of the International Symposium
, vol.25
, pp. 254-262
-
-
Turkot, R.B.1
Ramachandrarao, V.S.2
Iyer, S.A.3
Clark, S.C.4
-
3
-
-
0038377578
-
-
A. Sehgal, M.R. Yalamanchili, C. Millet, A. Danel, F. Tardif: Diffusion and Defect Data Pt.B: Solid State Phenomena 92 (2003), p 301-304.
-
(2003)
: Diffusion and Defect Data Pt.B: Solid State Phenomena
, vol.92
, pp. 301-304
-
-
Sehgal, A.1
Yalamanchili, M.R.2
Millet, C.3
Danel, A.4
Tardif, F.5
-
4
-
-
0035812811
-
-
J.M. Blackburn, D.L. Long, A. Cabanas, J.J. Watkins: Science 294 (2001), p. 141.
-
(2001)
Science
, vol.294
, pp. 141
-
-
Blackburn, J.M.1
Long, D.L.2
Cabanas, A.3
Watkins, J.J.4
-
5
-
-
0038110799
-
-
T. Rajagopalan, B. Lahlouh, J.A. Lubguban, S. Gangopadhyay, J. Sun, D.H. Huang, S.L. Simon, A. Mallikarjunan, H.-C. Kim, W. Volksen, M.F. Toney, E. Huang, P.M. Rice, E. Delenia, R.D. Miller: App. Phys. Lett. 82 (2003) p. 4328-4330.
-
(2003)
App. Phys. Lett
, vol.82
, pp. 4328-4330
-
-
Rajagopalan, T.1
Lahlouh, B.2
Lubguban, J.A.3
Gangopadhyay, S.4
Sun, J.5
Huang, D.H.6
Simon, S.L.7
Mallikarjunan, A.8
Kim, H.-C.9
Volksen, W.10
Toney, M.F.11
Huang, E.12
Rice, P.M.13
Delenia, E.14
Miller, R.D.15
-
6
-
-
84954267426
-
-
R.F. Reidy, B.P. Gorman, R.A. Orozco-Teran, Zhengping Zhang, Shelley Chang, D.W. Mueller: Advanced Metallization Conference, ed. B.M. Melnick, T.S. Cale, S. Zaima, T. Ohta 2002. p. 607-612..
-
-
-
Reidy, R.F.1
Gorman, B.P.2
Orozco-Teran, R.A.3
Zhang, Z.4
Chang, S.5
Mueller, D.W.6
-
7
-
-
84944043449
-
-
A. Danel, C. Millet, V. Perrut, J. Daviot, V. Jousseaume, O. Louveau, D. Louis: 2003 IEEE International Interconnect Technology Conference 2003, p. 248-250.
-
(2003)
IEEE International Interconnect Technology Conference 2003
, pp. 248-250
-
-
Danel, A.1
Millet, C.2
Perrut, V.3
Daviot, J.4
Jousseaume, V.5
Louveau, O.6
Louis, D.7
-
8
-
-
3242716917
-
-
B.P. Gorman, R.A. Orozco-Teran, Z. Zhang, P.D. Matz, D.W. Mueller, R.F. Reidy: Journal of Vacuum Science and Technology B 22 (2004) p.1210-1212.
-
(2004)
Journal of Vacuum Science and Technology B
, vol.22
, pp. 1210-1212
-
-
Gorman, B.P.1
Orozco-Teran, R.A.2
Zhang, Z.3
Matz, P.D.4
Mueller, D.W.5
Reidy, R.F.6
-
9
-
-
33645351655
-
-
Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics, Editors: R.J. Carter, C.S. Hau-Riege, G.M. Kloster, T.-M. Lu, S.E. Schulz, p. F1, 9
-
B. Xie, M.J. Muscat, MRS Proceedings Vol. 812, Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics, Editors: R.J. Carter, C.S. Hau-Riege, G.M. Kloster, T.-M. Lu, S.E. Schulz, p. F1.4-1.9.
-
MRS Proceedings
, vol.812
, pp. 4-11
-
-
Xie, B.1
Muscat, M.J.2
-
11
-
-
3042786288
-
Electrochemical Society Proceedings
-
V. Perrut, A. Danel, C. Millet, J. Daviot, M. Rignon, F. Tardif: Electrochemical Society Proceedings, v 25, Cleaning Technology in Semiconductor Device Manufacturing VII - Proceedings of the International Symposium 2003, p 246-253.
-
(2003)
Cleaning Technology in Semiconductor Device Manufacturing VII - Proceedings of the International Symposium
, vol.25
, pp. 246-253
-
-
Perrut, V.1
Danel, A.2
Millet, C.3
Daviot, J.4
Rignon, M.5
Tardif, F.6
-
12
-
-
85042814695
-
-
Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics, Editors: A. McKerrow, J. Leu, O. Kraft, T. Kikkawa
-
R.F. Reidy, Zhengping Zhang, R.A. Orozco-Teran, B.P. Gorman, D.W. Mueller: MRS Proceedings Vol 766, Materials, Technology, and Reliability for Advanced Interconnects and Low-k Dielectrics, Editors: A. McKerrow, J. Leu, O. Kraft, T. Kikkawa 2003, E6.10.
-
(2003)
Mueller: MRS Proceedings
, vol.766
-
-
Reidy, R.F.1
Zhengping Zhang, R.A.2
Orozco-Teran, B.P.3
Gorman, D.W.4
-
13
-
-
84954267428
-
-
http://www.lanl.gov/worldview/news/releases/archive/01-073.shtml.
-
-
-
-
14
-
-
0346158077
-
Alyssandrea Hamad, Christopher K. Ober
-
Victor Q. Pham, Robert J. Ferris, Alyssandrea Hamad, Christopher K. Ober: Chem. Mater. 15 (2003), p 4893-4895.
-
(2003)
Chem. Mater.
, vol.15
, pp. 4893-4895
-
-
Pham, V.Q.1
Ferris, R.J.2
-
15
-
-
0036029808
-
-
D. Flowers, E.N. Hoggan, R.G. Carbonell, J.M. DeSimone: Proceedings of the SPIE - The International Society for Optical Engineering, v 4690 2002, p 419-24.
-
(2002)
Proceedings of the SPIE - the International Society for Optical Engineering
, vol.4690
, pp. 419-424
-
-
Flowers, D.1
Hoggan, E.N.2
Carbonell, R.G.3
Desimone, J.M.4
-
16
-
-
0042266885
-
-
C.A. Jones, D. Yong, E.A. Irene, S.M. Gross, M. Wagner, J. DeYoung, J.M. DeSimone: Chem. Mater. 15 (2003), p. 2867-2869.
-
(2003)
Chem. Mater
, vol.15
, pp. 2867-2869
-
-
Jones, C.A.1
Yong, D.2
Irene, E.A.3
Gross, S.M.4
Wagner, M.5
Deyoung, J.6
Desimone, J.M.7
-
17
-
-
0037303628
-
-
T.I. Suratwala, M.L. Hanna, E.L. Miller, P.K. Whitman. I.M. Thomas, E.R. Ehrmann, R.S. Maxwell, A.K. Burnham, J. Noncrys. Sol. 316 (2003), p.349-363.
-
(2003)
J. Noncrys. Sol
, vol.316
, pp. 349-363
-
-
Suratwala, T.I.1
Hanna, M.L.2
Miller, E.L.3
Whitman, P.K.4
Thomas, I.M.5
Ehrmann, E.R.6
Maxwell, R.S.7
Burnham, A.K.8
-
18
-
-
0034255963
-
-
V. M. Gun'ko, M. S. Vedamuthu, G. L. Henderson and J. P. Blitz, J. Coll. Inter. Sci. 228 (2000), p.157-170.
-
(2000)
J. Coll. Inter. Sci
, vol.228
, pp. 157-170
-
-
Gun'ko, V.M.1
Vedamuthu, M.S.2
Henderson, G.L.3
Blitz, J.P.4
-
20
-
-
84954267429
-
-
R.F. Reidy, B.P. Gorman, D.W. Mueller, Z. Zhang, R. Orozco-Teran, SEMATECH Wafer Cleaning and Surface Preparation Workshop, May 2002.
-
(2002)
SEMATECH Wafer Cleaning and Surface Preparation Workshop
-
-
Reidy, R.F.1
Gorman, B.P.2
Mueller, D.W.3
Zhang, Z.4
Orozco-Teran, R.5
-
22
-
-
2942653168
-
-
G. Levitin, S. Myneni, D.W. Hess, J. Electrochem. Soc., 151 (2004), p.G380-G386.
-
(2004)
J. Electrochem. Soc.
, vol.151
, pp. G380-G386
-
-
Levitin, G.1
Myneni, S.2
Hess, D.W.3
-
23
-
-
0242416946
-
-
C.A. Bessel, G.M. Denison, J.M. DeSimone, J. DeYoung, S. Gross, C.K. Schanuer, P.M. Visintin, J. Am. Chem. Soc., 125 (2003) p.4980-4981.
-
(2003)
Chem. Soc.
, vol.125
, pp. 4980-4981
-
-
Bessel, C.A.1
Denison, G.M.2
Desimone, J.M.3
Deyoung, J.4
Gross, S.5
Schanuer, C.K.6
Visintin, P.M.7
Am, J.8
-
24
-
-
84902930391
-
-
G. Jacobson, B. Hansen, R. Kevwitch, M. Lowe, M. Najari, D. Yellowaga, M. Biberger, K. Hamamoto, D. Toma, P. Matz, T. Hurd, S. Ajmera, S.P. Rao: International Sematech Wafer Cleans and Surface Preparation Conference 2004: p.356-368.
-
(2004)
International Sematech Wafer Cleans and Surface Preparation Conference
, pp. 356-368
-
-
Jacobson, G.1
Hansen, B.2
Kevwitch, R.3
Lowe, M.4
Najari, M.5
Yellowaga, D.6
Biberger, M.7
Hamamoto, K.8
Toma, D.9
Matz, P.10
Hurd, T.11
Ajmera, S.12
Rao, S.P.13
|