Concept of ultra-fast at-wavelength inspection of defects on multilayer mask blanks using a laser-produced plasma source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 41-48

  Tomie, Toshihisa ^a   Terasawa, Tsuneo ^b   Tezuka, Yoshihiro ^b   Ito, Masaaki ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

At wavelength inspection; High NA dark field observation; Laser plasma; Schwarzschild objective; Two dimensional imaging; Ultra fast inspection

Indexed keywords

CALCULATIONS; DEFECTS; LASER PRODUCED PLASMAS; LIGHT SCATTERING; MIRRORS; OPTICAL MULTILAYERS; PHOTONS; PLASMA SOURCES; SYNCHROTRON RADIATION; ULTRAFAST PHENOMENA;

LASER PLASMA SOURCE; MULTILAYER MASK BLANKS; SCHWARZSCHILD OBJECTIVE; TWO DIMENSIONAL IMAGING; ULTRAFAST INSPECTION;

MASKS;

EID: 0141501068     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482811     Document Type: Conference Paper

References (3)

1. Yi et al., J. Vac. Sci. Tech B19 (2001) 2401
2. Yi et al.; Proc. SPIE 4688 (2002) 395
3. T. Tomie: Japanese Pat. application No. 2001-3099