Development of high power EUV sources for lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 626-633

  Borisov, Vladimir M ^b   Ahmad, Imtiaz ^a   Goetze, Sven ^a   Ivanov, Alexander S ^b   Khristoforov, Oleg B ^b   Kleinschmidt, Jurgen ^a   Korobotchko, Vladimir ^a   Ringling, Jens ^a   Schriever, Guido ^a   Stamm, Uwe ^a   Vinokhodov, Alexander Y ^b  

^a XTREME Technologies GmbH   (Germany)

^b TROITSK INSTITUTE FOR INNOVATION AND FUSION RESEARCH   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE COUPLED DEVICES; EXCIMER LASERS; MICROPROCESSOR CHIPS; PHOTODIODES; PLASMA SOURCES;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0012996674     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472338     Document Type: Article

References (2)

1. "High power EUV sources for lithography - A comparison of laser produced plasma and gas discharge produced plasma", Uwe Stamm, Imtiaz Ahmad, Vladimir M. Borisov, Frank Flohrer, Kai Gäbel, Sven Götze, Alexander S. Ivanov, Oleg B. Khristoforov, Diethard Klöpfel, Peter Köhler, Jürgen Kleinschmidt, Vladimir Korobotchko, Jens Ringling, Guido Schriever, Alexander Y. Vinokhodov, Proceedings of the SPIE 4688 no. 13 (2002)
2. "High power EUV sources based on gas discharge plasmas and laser produced plasmas", G. Schriever, U. Stamm, K. Gäbel, M. Darscht, V. Borisov, O. Khristoforov, A. Vinokhodov, to be published in Microelectronic Engineering (2002) (Proceedings of the MNE 2001)