Stress reduction of molybdenum/silicon multilayers deposited by ion-beam sputtering

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 620-627

  Shiraishi, Masayuki ^a   Ishiyama, Wakana ^a   Oshino, Tetsuya ^a   Murakami, Katsuhiko ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPRESSIVE STRESS; ION BEAMS; METALLIC SUPERLATTICES; MIRRORS; MOLYBDENUM; OPTICAL MULTILAYERS; SILICON; SPUTTERING; STRESS ANALYSIS; TENSILE STRESS; ULTRAVIOLET RADIATION;

ION BEAM POLISHING (IBP); ION BEAM SPUTTERING (IBS);

PHOTOLITHOGRAPHY;

EID: 0033697910     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)