High-resolution EUV Microstepper tool for resist testing & technology evaluation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 869-880

  Brunton, A ^a   Cashmore, J ^a   Elbourn, P ^a   Elliner, G ^a   Gower, M ^a   Grunewald P ^a   Harman, M ^a   Hough, S ^a   McEntee, N ^a   Mundair, S ^a   Rees, D ^a   Richards, P ^a   Truffert, V ^a   Wallhead, I ^a   Whitfield, M ^a  

^a Exitech Ltd   (United Kingdom)

Author keywords

EUV lithography; Microsteppers

Indexed keywords

ELECTROMAGNETIC WAVE REFLECTION; IMAGE PROCESSING; LASER OPTICS; PHOTORESISTORS; SEMICONDUCTOR MATERIALS; ULTRAHIGH VACUUM; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; MICROSTEPPERS; NUMERICAL APERTURE (NA);

PHOTOLITHOGRAPHY;

EID: 3843097074     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.548343     Document Type: Conference Paper

References (0)