Actinic detection of sub-100 nm defects on extreme ultraviolet lithography mask blanks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3009-3013

  Jeong, Seongtae ^a   Johnson, Lewis ^a   Rekawa, Seno ^a   Walton, Chris C ^b   Prisbrey, Shon T ^b   Tejnil, Edita ^c   Underwood, James H ^a   Bokor, Jeffrey ^a,d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c INTEL CORPORATION   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033265196     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590944     Document Type: Article

References (9)

1. See Proc. SPIE 3331, 2 (1998).
2. P. Yan, S. Yan, G. Zhang, J. Richards, P. Kofron, and J. Chow, 18th Annual Symposium on Photomask Technology and Management, Redwood City, California, 16-18 September 1998
3. [Proc. SPIE 3546, 206 (1998)].
4. K. Nguyen, Ph.D. dissertation, University of California, Berkeley, 1994.
5. Y. Lin and J. Bokor, J. Vac. Sci. Technol. B 15, 2467 (1997).
6. S. Jeong et al., J. Vac. Sci. Technol. B 16, 3430 (1998).
7. S. Jeong et al., Proc. SPIE 3676, 298 (1999).
8. S. Burkhart, C. Cerjan, S. Vernon, and C. Walton, Proc. SPIE 3676, 570 (1999).
9. Abbie Warrick, Lawrence Livermore National Laboratory (private communication).