SCOPUS 정보 검색 플랫폼

Volumn 7271, Issue , 2009, Pages

High-resolution defect inspection of step and flash imprint lithography for 32nm half pitch patterning

Author keywords

Electron beam; Electron beam inspection; Imprint lithography; Imprint mask; S FIL; Step and flash imprint lithography; Template

Indexed keywords

ELECTRON BEAM INSPECTION; IMPRINT LITHOGRAPHY; IMPRINT MASK; S-FIL; STEP AND FLASH IMPRINT LITHOGRAPHY; TEMPLATE;

DEFECTS; ELECTRON BEAMS; ELECTRONS; INSPECTION; PHOTOMASKS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SUPERCONDUCTING WIRE; ULTRAVIOLET RADIATION;

NANOIMPRINT LITHOGRAPHY;

EID: 67149124052 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.815014 Document Type: Conference Paper

Times cited : (10)

References (11)

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