EUV discharge light source based on a dense plasma focus operated with positive and negative polarity

Journal of Physics D: Applied Physics

Volumn 37, Issue 23, 2004, Pages 3266-3276

  Fomenkov, I V ^a   Bowering N ^a   Rettig, C L ^a   Melnychuk, S T ^a   Oliver, I R ^a   Hoffman, J R ^a   Khodykin, O V ^a   Ness, R M ^a   Partlo, W N ^a  

^a CYMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; ELECTRIC POTENTIAL; ION BOMBARDMENT; IONIZATION; LASER PRODUCED PLASMAS; LITHOGRAPHY; SILICON WAFERS; ULTRAVIOLET RADIATION;

DENSE PLASMA FOCUS; HEAT DEPOSITION; PLASMA DYNAMICS; PLASMA THRUSTERS;

LIGHT SOURCES;

EID: 10644271905     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/23/007     Document Type: Article

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