Top surface imaging resists for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 32-40

  Henderson, Craig ^a   Wheeler, David ^a   Pollagi, Tim ^a   O'Connell, Donna ^a   Goldsmith, John ^a   Fisher, Aaron ^a   Cardinale, Greg ^a   Hutchinson, John ^a   Rao, Veena ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Disilane; Extreme ultraviolet lithography; Silylation; Thin layer imaging; Top surface imaging

Indexed keywords

CROSSLINKING; ETCHING; IMAGING TECHNIQUES; MASKS; ULTRAVIOLET RADIATION;

SURFACE IMAGING;

LITHOGRAPHY;

EID: 0032401486     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309590     Document Type: Conference Paper

References (9)