Maskless lithography and nanopatterning with electron and ion multi-beam projection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Platzgummer, Elmar ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

direct write; electron beam projection optics; ion beam projection optics; mask writing; multi beam; programmable aperture plate system; template writing

Indexed keywords

DIRECT WRITE; ELECTRON BEAM PROJECTION OPTICS; ELECTRON-BEAM PROJECTION; MASK WRITING; MULTI-BEAM; PROGRAMMABLE APERTURE PLATES;

ELECTRON BEAMS; ELECTRONS; ION BEAMS; IONS; THROUGHPUT;

ELECTRON BEAM LITHOGRAPHY;

EID: 77953312554     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.852226     Document Type: Conference Paper

References (3)

1. Christof Klein, Jan Klikovits, Laszlo Szikszai, Elmar Platzgummer, and Hans Loeschner, "50 keV electron-beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5-nm sized beams", Proc. SPIE 7637, paper 7637-10 (2010).
2. Elmar Platzgummer, Christof Klein, Peter Joechl, Hans Loeschner, Martin Witt, Wolfgang Pilz, Joerg Butschke, Michael Jurisch, Florian Letzkus, Holger Sailer, and Mathias Irmscher, "Charged Particle Multi-Beam Lithography Evaluations for sub-16nm hp Mask Node Fabrication and Wafer Direct Write", Proc. SPIE (2009).
3. Gerhard Stengl, Elmar Platzgummer, and Hans Loschner, "Charged Particle Multi-Beam Exposure Apparatus", United States Patent 7,214,951 B2 (May 8, 2007).