Develpment of short pulse and high power CO2 laser for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5918, Issue , 2005, Pages 1-9

  Endo, Akira ^a   Hoshino, Hideo ^a   Ariga, Tatsuya ^a   Miura, Taisuke ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

Axial flow; CO2 Laser; EUV; Laser Produced Plasma

Indexed keywords

AXIAL FLOW; CARBON DIOXIDE; LIGHT SOURCES; OSCILLATIONS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION; XENON;

CO2 LASER; EUV; EUV LIGHT SOURCES;

LASER PRODUCED PLASMAS;

EID: 30844438922     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.616342     Document Type: Conference Paper

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