Extreme ultraviolet light sources for use in semiconductor lithography - State of the art and future development

Journal of Physics D: Applied Physics

Volumn 37, Issue 23, 2004, Pages 3244-3253

  Stamm, Uwe ^a  

^a XTREME Technologies   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE LAMPS; EXCIMER LASERS; IONIZATION; LASER PRODUCED PLASMAS; LIGHT AMPLIFIERS; LITHOGRAPHY; OPTIMIZATION; THERMAL LOAD; ULTRAVIOLET RADIATION;

CONVERSION EFFICIENCY (CE); EXTREME ULTRAVIOLET (EUV) LIGHT SOURCES; GAS DISCHARGE-PRODUCED PLASMA (GDPP); LASER POWER;

LIGHT SOURCES;

EID: 10644258117     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/23/005     Document Type: Review

References (11)

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