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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

Molecular glass resists for EUV lithography

(3) De Silva, Anuja a Forman, Drew a Ober, Christopher K a

a Cornell University (United States)

Author keywords

Chemical Amplification; EUV; Glass Transition Temperature; Molecular Glass Resists

Indexed keywords

CRYSTALLIZATION; ELECTRON BEAM LITHOGRAPHY; GLASS TRANSITION; MOLECULAR WEIGHT; TEMPERATURE; ULTRAVIOLET RADIATION;

CHEMICAL AMPLIFICATION; EUV; MOLECULAR GLASS RESISTS;

PHOTORESISTS;

EID: 33745611562 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.656559 Document Type: Conference Paper

Times cited : (16)

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