Characterization of striae in ULE® for EUVL optics and masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Rosch, William ^a   Beall, Lorrie ^a   Maxon, John ^a   Sabia, Robert ^a   Sell, Robert ^a  

^a Corning Incorporated ^*  (United States)

Author keywords

Birefringence; EUVL; Frequency; Photomasks; Retardation; Spatial frequency roughness; Striae; Titania; ULE

Indexed keywords

BIREFRINGENCE; GLASS; MASKS; NATURAL FREQUENCIES; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

EUVL; PHOTOMASKS; RETARDATION; SPATIAL FREQUENCY ROUGHNESS; STRIAE; ULE;

LASER OPTICS;

EID: 33745630639     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656355     Document Type: Conference Paper

References (6)

1. Hrdina, "Production and properties of ULE® glass with regards to EUV masks", The International workshop on Extreme Ultraviolet Lithography, October 10-13, 1999.
2. Shaffer and Bennett, "Effect of Thermal Cycling on Dimensional Stability of Zerodur and ULE", Applied Optics, 23 [17] 2852-2853, September 1, 1984.
3. Jacobs, Johnston, Sasian, Watson, Targrove, Bass, "Surface Figure Changes Due to Thermal Cycling Hysteresis", Applied Optics, 26 [20] 4438-4442 October 15, 1987.
4. Pepi and Golini, "Delayed Elastic Effects in the Glass Ceramic Zerodur and ULE at Room Temperature", Applied Optics, 30 [22], 3087-3088 August 1, 1991.
5. Wilkins, Coon, Epstein, "Elastic Hysteresis Phenomena in ULE and Zerodur Optical Glasses at Elevated Temperatures", SPIE, 970, 40-46, in Properties and Characteristics of Optical Glass (1988).
6. Hrdina, Hanson, Fenn, Sabia, "Characterization and characteristics of a ULE glass tailored for EUVL needs", SPIE 4688-52, 454 2002.