Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography

Journal of Physics D: Applied Physics

Volumn 37, Issue 23, 2004, Pages 3213-3224

  Krücken, Thomas ^a   Bergmann, Klaus ^b   Juschkin, Larissa ^c   Lebert, Rainer ^c  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^c AIXUV GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; CARRIER CONCENTRATION; ELECTRIC CURRENTS; IONIZATION; LEAKAGE CURRENTS; LITHOGRAPHY; SILICON WAFERS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); PLASMA DISCHARGES; RADIATION TRANSFER; REFLECTIVE MIRRORS;

PLASMA SOURCES;

EID: 10644279311     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/23/002     Document Type: Article

References (25)

1. Banine V and Moers R 2001 Proc. SPIE 4343 203-14
2. Hassanein A, Sizyuk V, Tolkach V, Morozov V and Sizyuk T 2004 Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices Proc. SPIE 5374 413
3. Bauer B S, Mancini R C, Makhin V, Paraschiv I, Esaulov A and Presura R 2004 Development of magnetohydrodynamic computer modelling of gas-discharge EUV sources for microlithography Proc. SPIE 5374 394
4. Tomie T 2001 Theoretical considerations on plasma sources for 50 W EUV power extraction EUV Workshop (Matsue, 2001)
5. Lebert R, Bergmann K, Juschkin L, Rosier O and Neff W 2001 Comparison of different source concepts for EUVL Proc. SPIE 4343
6. Bergmann K, Schriever G, Rosier O, Müller M, Neff W and Lebert R 1999 Appl. Opt. 38 5413
7. Bergmann K, Rosier O, Neff W and Lebert R 2000 Appl. Opt. 39 3833
8. Pankert J et al 2002 Physical properties of the HCT source SPIE Microlithography 2002 (Santa Clara, 5-7 March 2003) Proc. SPIE 4688 106
9. Pankert J et al 2003 Physical properties of the HCT source SPIE Microlithography 2003 (Santa Clara, 25-27 March 2003) Proc. SPIE 5037 15
10. Pankert J et al 2005 Hollow cathode triggered plasma pinch discharge (Special issue on EUV sources) SPIE submitted
11. Pankert J et al 2003 Power scaling, electrode lifetime and debris mitigation 2nd Int. EUV Lithography Symp. (Belgium, Antwerp, 2003)
12. Derra G and Singer W 2003 SPIE Microlithography 2003 (Santa Clara, 23-28 March 2003)
13. Me Whirter R W P 1965 Plasma Diagnostic Techniques (New York: Academic) p 201
14. Summers H et al 1997 Atomic Data and its Utilisation at the Jet Experiment (Plenum Press Series Physics of Photons and Molecules, Photon and Electron Collisions with Atoms and Molecules) ed P G Burke and C J Joachain, p 265, see also http://adas/phys/strath.ac
15. O'Mullane M G, Sumers H P, Whiteford A D and Loch S D 2004 Ionisation state, excited populations and emission of impurities in finite density plasmas Plasma Phys. Control. Fusion submitted
16. Cowan R D 1981 The Theory of Atomic Spectra (Berkeley, CA: University of California Press)
17. Böwering N et al 2003 J. Appl. Phys. 94 16
18. O'Sullivan G 2003 EUVL Source Workshop (Antwerp, 2003)
19. Gilleron F et al 2003 J. Appl. Phys. 94 2086
20. Hassanein et al 2004 J. Microlithogr. Microfabrication Microsyst. 3 130
21. Zakharov S V, Choi P, Novikov V G, Solomyannaya A D and Kroukovski A Yu 2002 Performance evaluation on discharge EUV sources using 2-D radiation MHD simulations 1st Int. EUVL Symp. (Dallas, 2002)
22. Irons F E 1979 The escape factor in plasma spectroscopy - 1. The escape factor defined and evaluated J. Quant. Spectrosc. Radiat. Transfer 22 1
23. Behringer K 1998 Escape factors for the line emission and population calculations Max-Planck-Institute for Plasma Physics Report IPP 10/11
24. O'Sullivan G and Carroll P K 1980 Opt. Soc. Am. 71 227
25. Miyamoto T 1984 Analysis of high density z-pinches by snowplow energy equation Nucl. Fusion 24 337